Fucheng Chen

Title: Fucheng Chen: Innovator in Semiconductor Technologies

Introduction

Fucheng Chen is a prominent inventor based in Shanghai, China, known for his significant contributions to the field of semiconductor technologies. With a total of eight patents to his name, Chen has developed innovative methods that enhance the manufacturing processes of semiconductor devices.

Latest Patents

Among his latest patents is a method for manufacturing semiconductor apparatus. This method involves forming a water film on the surfaces of two wafers, attaching them, and then subjecting them to a thermal annealing process in a vacuum environment. This technique effectively reduces bubble voids between the bonded wafers. Another notable patent is for a backside illumination sensor, which simplifies the process of drawing out and isolating pads in semiconductor devices. This invention includes a device substrate with a dielectric layer and metal wire, enhancing the technical requirements of a back seal ring.

Career Highlights

Fucheng Chen has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His expertise in semiconductor technologies has positioned him as a key figure in the development of advanced manufacturing techniques.

Collaborations

Throughout his career, Chen has collaborated with notable professionals in the field, including Herb He Huang and Linbo Shi. These collaborations have contributed to the advancement of semiconductor technologies and the successful implementation of innovative solutions.

Conclusion

Fucheng Chen's work in semiconductor technologies exemplifies the impact of innovation in the industry. His patents and career achievements highlight his role as a leading inventor in this critical field.