The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2016
Filed:
Nov. 21, 2014
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Fucheng Chen, Shanghai, CN;
Herb He Huang, Shanghai, CN;
Abstract
A method for manufacturing a substrate may include processing a substrate material member to form a first remaining portion. The first remaining portion has a first cavity. A sidewall the first cavity is oriented at a first angle with respect to at least one of a horizontal plane and a bottom side of the first remaining portion. The method may further include providing a sacrificial material member in the first cavity. The method may further include processing the sacrificial material member when processing the first remaining portion to remove the sacrificial material member and to form a second remaining portion. The second remaining portion has a second cavity. A sidewall the second cavity is oriented at a second angle with respect to at least one of the horizontal plane and a bottom side of the second remaining portion. The second angle is smaller than the first angle.