Fu-Jye Liang

This inventor holds 21 USPTO granted patents, primarily in Photolithography Techniques. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2006-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fu-Jye Liang. Retrieved from https://idiyas.com/inventor/fu-jye-liang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 21

% Patents Active = 47.6

Average Co-Inventor Count = 5.4

ph-index = 3

Forward Citations = 57(Granted Patents)

Location History:

Kaoshiung, TW (2013)
Kaohsiung, TW (2006 - 2016)
Zhubel, TW (2016)
Hsinchu County, TW (2018)
Zhubei, TW (2015 - 2023)

Company Filing History:

21 out of 42,965

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

Years Active: 2006-2023

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Areas of Expertise:

Exposure Manufacturing

Image-Error Compensation

Reticle Masking

Overlay Quality

Depth of Focus

Lithography Patterning

Printing Accuracy

Semiconductor Manufacturing

Immersion Lithography

Pattern Compensation

Stitching

Scan Optimization

21 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11594528 - Layout modification method for exposure manufacturing process (2023-02-28),

2. 11150561 - Method and apparatus for collecting information used in image-error compensation (2021-10-19),

3. 11024623 - Layout modification method for exposure manufacturing process (2021-06-01),

4. 10871713 - Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning (2020-12-22),

5. 10720419 - Layout modification method for exposure manufacturing process (2020-07-21),

6. 10712651 - Method and apparatus for collecting information used in image-error compensation (2020-07-14),

7. 10642158 - Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning (2020-05-05),

8. 10366973 - Layout modification method for exposure manufacturing process (2019-07-30),

9. 10146141 - Lithography process and system with enhanced overlay quality (2018-12-04),

10. 9360778 - System and method for lithography patterning (2016-06-07),

11. 9360767 - Method and apparatus for maintaining depth of focus (2016-06-07),

12. 9158209 - Method of overlay prediction (2015-10-13),

13. 9025130 - Method and apparatus for maintaining depth of focus (2015-05-05),

14. 8592107 - Method and apparatus of providing overlay (2013-11-26),

15. 8520189 - Method and apparatus for maintaining depth of focus (2013-08-27),

Title: Fu-Jye Liang: Innovator from Zhubei

Introduction: Fu-Jye Liang is a renowned inventor hailing from Zhubei, Taiwan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Fu-Jye Liang holds several patents in the areas of electronics, renewable energy, and sustainable technologies, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Fu-Jye Liang has worked with leading research institutions and technology companies, where he has spearheaded projects that have revolutionized the industry.

Collaborations: Throughout his career, Fu-Jye Liang has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Fu-Jye Liang's passion for innovation and his relentless pursuit of technological advancement have solidified his position as a visionary inventor in the global tech community.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]