The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Jul. 13, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Hung-Wen Cho, Hsinchu, TW;

Fu-Jye Liang, Zhubei, TW;

Chun-Kuang Chen, Guanxi Township, Hsinchu County, TW;

Chih-Tsung Shih, Hsinchu, TW;

Li-Jui Chen, Hsinchu, TW;

Po-Chung Cheng, Zhongpu Township, Chiayi County, TW;

Chin-Hsiang Lin, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/22 (2006.01); G03F 1/22 (2012.01); G03F 1/44 (2012.01); G03F 1/36 (2012.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G03F 7/70441 (2013.01); G03F 7/2004 (2013.01); G03F 7/70483 (2013.01); G03F 1/22 (2013.01); G03F 1/36 (2013.01); G03F 1/44 (2013.01); G03F 7/22 (2013.01); G06T 7/001 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A method for collecting information in image-error compensation is provided. The method includes providing a reticle having a first image structure and a second image structure; moving a light shading member to control a first exposure field; projecting a light over the first exposure field; recording an image of the first image structure after the light is projected; moving the light shading member to control a second exposure field; projecting the light over the second exposure field; and recording an image of the second image structure after the light is projected.


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