Frank Mauersberger

Title: Frank Mauersberger: Innovator in Semiconductor Technology

Introduction

Frank Mauersberger is a notable inventor based in Radebeul, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on enhancing the performance and efficiency of dielectric materials used in electronic devices.

Latest Patents

Mauersberger's latest patents include a method of forming a cap layer with anti-reflective characteristics on top of a low-k dielectric. This innovative method involves creating a multi-layer stack that improves the anti-reflective effect while protecting the underlying low-k dielectric material during the chemical mechanical polishing process. The stack consists of silicon dioxide-based sub-layers, which can be formed using a cost-effective plasma-enhanced deposition method. The optical characteristics of the layers can be adjusted by varying the ratio of silane and nitrogen oxide during deposition. Another significant patent involves a method of electroplating copper over a patterned dielectric layer to enhance the process uniformity of subsequent CMP processes. This method creates surface roughness on non-patterned regions of the dielectric layer, improving the uniformity of material removal during chemical mechanical polishing.

Career Highlights

Frank Mauersberger is currently employed at Advanced Micro Devices Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of electronic devices, particularly in the area of dielectric materials.

Collaborations

Mauersberger has collaborated with notable colleagues, including Frederick N Hause and Paul Raymond Besser. Their combined expertise has contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Frank Mauersberger's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced electronic materials and processes.