The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2005
Filed:
Sep. 19, 2003
Applicants:
Gerd Marxsen, Radebeul, DE;
Axel Preusse, Radebeul, DE;
Markus Nopper, Dresden, DE;
Frank Mauersberger, Radebeul, DE;
Inventors:
Gerd Marxsen, Radebeul, DE;
Axel Preusse, Radebeul, DE;
Markus Nopper, Dresden, DE;
Frank Mauersberger, Radebeul, DE;
Assignee:
Advanced Micro Devices, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/461 ; H01L021/4763 ;
U.S. Cl.
CPC ...
Abstract
In a new method of plating metal onto dielectric layers including small diameter vias and large diameter trenches, a surface roughness is created at least on non-patterned regions of the dielectric layer to enhance the uniformity of material removal in a subsequent chemical mechanical polishing (CMP) process.