Gerd Marxsen

This inventor holds 14 USPTO granted patents and 1 published patent application, primarily in Chemical Mechanical Polishing. Top assignees: Advanced Micro Devices Corporation, Globalfoundries Inc.. Active years: 2003-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gerd Marxsen. Retrieved from https://idiyas.com/inventor/gerd-marxsen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 14 (Patent Applications = 1)

% Patents Active = 57.1

Average Co-Inventor Count = 2.4

ph-index = 5

Forward Citations = 49(Granted Patents)

Company Filing History:

10 out of 13,185

Advanced Micro Devices Corporation

Years Active: 2003-2013

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Areas of Expertise:

Semiconductor Device

Replacement Gate

Chemical Mechanical Polishing

Electrochemical Deposition

Defect Reduction

Temperature Control

Polishing Process

Endpoint Detection

Metal Damascene

Process Uniformity

Substrate Polishing

Cap Layer

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8383500 - Semiconductor device formed by a replacement gate approach based on an early work function metal (2013-02-26),

2. 8183139 - Reduced defectivity in contacts of a semiconductor device comprising replacement gate electrode structures by using an intermediate cap layer (2012-05-22),

3. 8182709 - CMP system and method using individually controlled temperature zones (2012-05-22),

4. 8152595 - System and method for optical endpoint detection during CMP by using an across-substrate signal (2012-04-10),

5. 8138038 - Superior fill conditions in a replacement gate approach by performing a polishing process based on a sacrificial fill material (2012-03-20),

6. 7985329 - Technique for electrochemically depositing an alloy having a chemical order (2011-07-26),

7. 7905764 - Polishing head using zone control (2011-03-15),

8. 7268000 - Method and system for controlling the chemical mechanical polishing of substrates by calculating an overpolishing time and/or a polishing time of a final polishing step (2007-09-11),

9. 6958247 - Method of electroplating copper over a patterned dielectric layer to enhance process uniformity of a subsequent CMP process (2005-10-25),

10. 6957997 - Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner (2005-10-25),

11. 6774030 - Method and system for improving the manufacturing of metal damascene structures (2004-08-10),

12. 6761812 - Apparatus and method for electrochemical metal deposition (2004-07-13),

13. 6752697 - Apparatus and method for chemical mechanical polishing of a substrate (2004-06-22),

14. 6620726 - Method of forming metal lines having improved uniformity on a substrate (2003-09-16),

Title: The Innovative Mind of Gerd Marxsen

Introduction

Gerd Marxsen, an esteemed inventor based in Radebeul, Germany, has made considerable contributions to the field of semiconductor technology. With a remarkable portfolio of 14 patents, his innovations have pushed the boundaries of manufacturing processes and material properties in the tech industry.

Latest Patents

Among his latest inventions, one notable patent involves a semiconductor device formed by a replacement gate approach based on an early work function metal. This approach allows for the incorporation of a work function metal during the initial manufacturing stages, which reduces deposition steps in later phases. This optimization leads to improved processing conditions compared to traditional methods.

Additionally, Marxsen has developed a CMP system and method utilizing individually controlled temperature zones. By establishing a temperature profile across a polishing pad, he is able to achieve a varying removal rate across a substrate, which ensures efficient polishing of highly sensitive materials, such as low-k dielectrics. This innovation enhances control during polishing processes, showcasing his commitment to advancing semiconductor manufacturing techniques.

Career Highlights

Throughout his career, Gerd Marxsen has worked with notable companies in the industry, including Advanced Micro Devices (AMD) and Globalfoundries Inc. His experiences at these leading organizations have significantly influenced his inventive output and allowed him to refine his expertise in semiconductor technologies.

Collaborations

Marxsen has collaborated with talented individuals in the field, including coworkers Axel Preusse and Jens Heinrich. These partnerships have further fueled his innovative spirit, leading to advancements that benefit the semiconductor industry as a whole.

Conclusion

Gerd Marxsen's contributions as an inventor in the semiconductor realm are invaluable, with a focus on enhancing manufacturing processes and material functionality. His 14 patents reflect a commitment to innovation and a profound understanding of technology, validating his reputation as a leading figure in the industry. As advancements continue, Marxsen's work will likely inspire future innovations in semiconductor technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

1 patent pending: