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Axel Preusse

This inventor holds 29 USPTO granted patents and 1 published patent application. Top assignees: Advanced Micro Devices Corporation, Globalfoundries Inc., Amd Inc.. Active years: 2000-2017.

USPTO Granted Patents = 29 (Patent Applications = 1)

% Patents Active = 55.2

Average Co-Inventor Count = 2.8

ph-index = 6

Forward Citations = 97(Granted Patents)

Location History:

Sunnyvale, CA (US) (2000 - 2002)
Radebeul, DE (2003 - 2017)

Company Filing History:

20 out of 13,151

Advanced Micro Devices Corporation

Years Active: 2000-2017

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29 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9620453 - Semiconductor structure including a layer of a first metal between a diffusion barrier layer and a second metal and method for the formation thereof (2017-04-11),

2. 9305878 - Integrated circuits and methods for fabricating integrated circuits with capping layers between metal contacts and interconnects (2016-04-05),

3. 8951900 - Contact elements of a semiconductor device formed by electroless plating and excess material removal with reduced sheer forces (2015-02-10),

4. 8932911 - Integrated circuits and methods for fabricating integrated circuits with capping layers between metal contacts and interconnects (2015-01-13),

5. 8883610 - Microstructure device including a metallization structure with self-aligned air gaps between closely spaced metal lines (2014-11-11),

6. 8450197 - Contact elements of a semiconductor device formed by electroless plating and excess material removal with reduced sheer forces (2013-05-28),

7. 8389401 - Contact elements of semiconductor devices formed on the basis of a partially applied activation layer (2013-03-05),

8. 8314494 - Metal cap layer of increased electrode potential for copper-based metal regions in semiconductor devices (2012-11-20),

9. 8153524 - Providing superior electromigration performance and reducing deterioration of sensitive low-k dielectrics in metallization systems of semiconductor devices (2012-04-10),

10. 7985329 - Technique for electrochemically depositing an alloy having a chemical order (2011-07-26),

11. 7981793 - Method of forming a metal directly on a conductive barrier layer by electrochemical deposition using an oxygen-depleted ambient (2011-07-19),

12. 7947158 - Apparatus and method for removing bubbles from a process liquid (2011-05-24),

13. 7781329 - Reducing leakage in dielectric materials including metal regions including a metal cap layer in semiconductor devices (2010-08-24),

14. 7745327 - Method of forming a copper-based metallization layer including a conductive cap layer by an advanced integration regime (2010-06-29),

15. 7615103 - Apparatus and method for removing bubbles from a process liquid (2009-11-10),

Title: The Innovative Mind of Axel Preusse

Introduction: Axel Preusse, a distinguished inventor hailing from Radebeul, Germany, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Axel Preusse holds several patents in various technological domains, including advancements in renewable energy systems, smart home automation, and medical devices.

Career Highlights: With a career spanning over two decades, Axel Preusse has consistently pushed the boundaries of innovation. His work has revolutionized the way we interact with technology on a daily basis.

Collaborations: Throughout his career, Axel Preusse has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His collaborative spirit has led to the development of cutting-edge technologies that have impacted industries worldwide.

Conclusion: Axel Preusse's relentless pursuit of innovation and his passion for creating solutions to complex problems have solidified his position as a visionary inventor in the world of technology. His contributions continue to inspire future generations of inventors and innovators.

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