The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Jun. 11, 2001
Frederick N. Hause, Austin, TX (US);
Paul R. Besser, Sunnyvale, CA (US);
Frank Mauersberger, Radebeul, DE;
Errol Todd Ryan, Austin, TX (US);
William S. Brennan, Austin, TX (US);
John A. Iacoponi, Austin, TX (US);
Peter J. Beckage, Austin, TX (US);
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
A method for forming a conductive interconnect comprises forming a process layer over a structure layer and forming a mask over the process layer, the mask having an etch profile therein. An anisotropic etching process is performed to erode the mask and to form an etched region in the process layer, the etched region having a profile correlating to the etch profile. A conductive material is formed in the etched region in the process layer and any excess conductive material is removed from above an upper surface of the process layer.