Valkenswaard, Netherlands

Frank Auer

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 2.5

ph-index = 5

Forward Citations = 81(Granted Patents)


Location History:

  • Eindhoven, NL (2002 - 2004)
  • Valkenswaard, NL (2006 - 2023)

Company Filing History:


Years Active: 2002-2023

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12 patents (USPTO):Explore Patents

Title: Frank Auer: Innovating Precision through Patents

Introduction: Frank Auer, a visionary inventor based in Valkenswaard, NL, has revolutionized the world of lithographic apparatus with his ingenious creations. With 12 patents to his name, Auer has been at the forefront of technological advancements in the field.

Latest Patents: Auer's latest patents include a cutting-edge stage system and lithographic apparatus. The stage system features a movable stage with a reflective surface, optical position and shape sensors, and a position measurement controller, enabling precise positioning for optimal performance. His substrate positioning system offers incremental and absolute position measurements for seamless object positioning in lithographic processes.

Career Highlights: A key figure at ASML Netherlands B.V., Auer has been instrumental in driving innovation and excellence within the company. His contributions have not only enhanced the efficiency of lithographic apparatus but have also set new standards in the industry.

Collaborations: Auer's innovative work has been complemented by collaborations with esteemed colleagues such as Hans Butler and Hendrikus Herman Marie Cox. Together, they have pushed boundaries, exchanged ideas, and achieved remarkable milestones in the realm of lithography.

Conclusion: Frank Auer's inventive spirit and dedication to precision have cemented his legacy as a pioneering inventor in the field of lithographic apparatus. His patents stand as a testament to his ingenuity and commitment to pushing the boundaries of technological advancement.

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