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For the Inventor, By the Inventor

Valkenswaard, Netherlands

Frank Auer

This inventor holds 12 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Asml Netherlands B.v.. Active years: 2002-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Frank Auer. Retrieved from https://idiyas.com/inventor/frank-auer-ep33akxv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12 

% Patents Active = 83.3


Average Co-Inventor Count = 2.5

ph-index = 5

Forward Citations = 82(Granted Patents)


Location History:

  • Eindhoven, NL (2002 - 2004)
  • Valkenswaard, NL (2006 - 2023)

Company Filing History:

goldMedal12 out of 5,075 
 
Asml Netherlands B.v.
 patents

Years Active: 2002-2023

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12 patents (USPTO):Explore Patents
1. 11556066 - Stage system and lithographic apparatus (2023-01-17),
2. 9470988 - Substrate positioning system, lithographic apparatus and device manufacturing method (2016-10-18),
3. 8879044 - Lithographic apparatus, and motor cooling device (2014-11-04),
4. 8189174 - Lithographic apparatus provided with a swap bridge (2012-05-29),
5. 7936443 - Lithographic apparatus and device manufacturing method (2011-05-03),
6. 7916267 - Lithographic apparatus, and motor cooling device (2011-03-29),
7. 7830495 - Lithographic apparatus and position sensor (2010-11-09),
8. 7170582 - Support device and lightographic apparatus (2007-01-30),
9. 7084956 - Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device (2006-08-01),
10. 6791664 - Lithographic apparatus, device manufacturing method, and device manufacturing thereby (2004-09-14),
11. 6788386 - Lithographic apparatus and device manufacturing method (2004-09-07),
12. 6473161 - Lithographic projection apparatus, supporting assembly and device manufacturing method (2002-10-29),

Title: Frank Auer: Innovating Precision through Patents

Introduction: Frank Auer, a visionary inventor based in Valkenswaard, NL, has revolutionized the world of lithographic apparatus with his ingenious creations. With 12 patents to his name, Auer has been at the forefront of technological advancements in the field.

Latest Patents: Auer's latest patents include a cutting-edge stage system and lithographic apparatus. The stage system features a movable stage with a reflective surface, optical position and shape sensors, and a position measurement controller, enabling precise positioning for optimal performance. His substrate positioning system offers incremental and absolute position measurements for seamless object positioning in lithographic processes.

Career Highlights: A key figure at ASML Netherlands B.V., Auer has been instrumental in driving innovation and excellence within the company. His contributions have not only enhanced the efficiency of lithographic apparatus but have also set new standards in the industry.

Collaborations: Auer's innovative work has been complemented by collaborations with esteemed colleagues such as Hans Butler and Hendrikus Herman Marie Cox. Together, they have pushed boundaries, exchanged ideas, and achieved remarkable milestones in the realm of lithography.

Conclusion: Frank Auer's inventive spirit and dedication to precision have cemented his legacy as a pioneering inventor in the field of lithographic apparatus. His patents stand as a testament to his ingenuity and commitment to pushing the boundaries of technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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