The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Oct. 17, 2013
Asml Netherlands B.v., Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Albert Johannes Maria Jansen, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Johannes Mathias Theodorus Antonius Adriaens, Eindhoven, NL;
Frank Auer, Valkenswaard, NL;
Peterjan Broomans, Eindhoven, NL;
Suzanne Johanna Antonetta Geertruda Cosijns, Casteren, NL;
Willem Herman Gertruda Anna Koenen, Roermond, NL;
Sebastiaan Smit, Utrecht, NL;
Joris Wilhelmus Henricus Vermunt, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.