Francois Boedt

Title: The Innovative Contributions of Francois Boedt

Introduction

Francois Boedt is a notable inventor based in Meylan, France. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on processes that enhance the manufacturing of semiconductor substrates and composite structures.

Latest Patents

Francois Boedt's latest patents include a "Process for manufacturing a semiconductor substrate" and a "Process for manufacturing a composite structure." The first patent describes a method that involves providing a donor semiconductor substrate with a useful silicon layer, inspecting it for cavities, and manufacturing a substrate if the defect density is acceptable. The second patent outlines a process that includes steps for joining a donor substrate and a carrier substrate, forming dielectric and covering layers, and fracturing the donor substrate to create a composite structure.

Career Highlights

Francois Boedt is currently associated with Soitec, a company known for its innovative semiconductor solutions. His work at Soitec has positioned him as a key player in advancing semiconductor manufacturing techniques.

Collaborations

Francois collaborates with talented individuals such as Sebastien Kerdiles and Roland Brun, contributing to a dynamic team focused on innovation in semiconductor technology.

Conclusion

Francois Boedt's contributions to semiconductor technology through his patents and work at Soitec highlight his role as an influential inventor in the field. His innovative processes continue to shape the future of semiconductor manufacturing.