The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

May. 19, 2016
Applicant:

Soitec, Crolles Cedex, FR;

Inventors:

Ludovic Ecarnot, Vaulnaveys-le-Haut, FR;

Nicolas Daval, Lumbin, FR;

Nadia Ben Mohamed, Echirolles, FR;

Francois Boedt, Meylan, FR;

Carole David, Crolles, FR;

Isabelle Guerin, Grenoble, FR;

Assignee:

Soitec, Bernin, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/762 (2006.01); H01L 21/02 (2006.01); B28D 5/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76251 (2013.01); B28D 5/00 (2013.01); H01L 21/02002 (2013.01); H01L 21/76254 (2013.01);
Abstract

A method for transferring a layer from a single-crystal substrate, called a donor substrate, onto a receiver substrate, includes supplying the single-crystal donor substrate, the substrate having a notch oriented in a first direction of the crystal and a weakness region bounding the layer to be transferred, bonding of the single-crystal donor substrate onto the receiver substrate, the main surface of the donor substrate opposite to the weakness region with respect to the layer to be transferred being at the bonding interface, and detachment of the donor substrate along the weakness region. In the method, the donor substrate has, on the main surface bonded to the receiver substrate, an array of atomic steps extending essentially in a second direction of the crystal different from the first direction.


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