This inventor holds 29 USPTO granted patents and 1 published patent application, primarily in Imprint Lithography. Top assignees: International Business Machines Corporation, Jsr Corporation, Macronix International Co., Ltd.. Active years: 1986-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Fremont, CA (US) (1986 - 2014)
- San Jose, CA (US) (2014)
Company Filing History:
29 out of 166,351 
2 out of 1,078 
2 out of 3,609 
Years Active: 1986-2014
Areas of Expertise:
Title: Innovator Spotlight: Frances Anne Houle from Fremont, CA
Introduction: Frances Anne Houle, based in Fremont, California, is a prolific inventor with a remarkable portfolio of 29 patents. Her innovations primarily focus on advancing photolithography and imprint lithography technologies, contributing significantly to the field.
Latest Patents: Among her latest work, Frances has developed a method and apparatus for sub-pellicle defect reduction on photomasks. This invention describes a photomask utilized in photolithography, consisting of a substrate with a patterns formed on it, featuring a protective coating made from silicon-based compounds. Furthermore, she has also patented an innovative approach involving aromatic vinyl ether-based reverse-tone step and flash imprint lithography. This method details the formation of a pattern using a molding composition of aromatic divinyl ethers, along with various steps for curing and removing materials to achieve intricate design patterns on substrates.
Career Highlights: Frances has held significant roles at leading organizations such as IBM and Macronix International Co., Ltd. Her work in these capacities has enabled her to push the boundaries of technology in the fields of semiconductor manufacturing and lithography.
Collaborations: Throughout her career, Frances has collaborated with notable peers such as Hiroshi Ito and William Dinan Hinsberg. These collaborations have fostered an environment of creativity and technical advancement, further enhancing her contributions to the industry.
Conclusion: Frances Anne Houle's dedication to innovation in photolithography and imprint lithography marks her as a vital figure in her field. Her extensive patent portfolio not only showcases her inventive spirit but also reflects her commitment to advancing technology for future generations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile