The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2012

Filed:

Feb. 09, 2009
Applicants:

Frances A. Houle, Fremont, CA (US);

Taiichi Furukawa, Sunnyvale, CA (US);

Inventors:

Frances A. Houle, Fremont, CA (US);

Taiichi Furukawa, Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 4/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Coating compositions suitable for UV imprint lithographic applications are disclosed that include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; and at least one photoacid generator soluble in a selected one or both of the at least one monofunctional ether compound and the at least one vinyl ether compound, wherein the at least one monofunctional ether compound and the at least one vinyl ether compound are free from fluorine and silicon substituents. Also disclosed are imprint processes.


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