Feiyue Ma

Title: Feiyue Ma: Innovator in Semiconductor Processing

Introduction

Feiyue Ma is a prominent inventor based in San Jose, California, known for his significant contributions to semiconductor processing technologies. With a total of seven patents to his name, he has made notable advancements in methods that enhance the efficiency and effectiveness of metal gapfill processes.

Latest Patents

One of Feiyue Ma's latest patents is titled "Method for forming a metal gapfill." This patent describes a multi-step process for processing substrates, which includes forming a seamless metal gapfill in an opening. The method involves creating a first portion of the metal gapfill, performing a sputter process to apply layers on the side walls, and growing a second portion to fill the opening completely. This innovative approach ensures that fluids used in subsequent processes do not diffuse through the metal gapfill, thereby improving the reliability of semiconductor devices.

Another significant patent is "Metal recess for semiconductor structures." This patent outlines exemplary methods for etching various metal-containing materials within a semiconductor processing chamber. The process includes flowing an oxygen-containing precursor and oxidizing the metal-containing material, which is arranged within recesses defined by vertical columns. This method enhances the precision of etching and contributes to the overall performance of semiconductor structures.

Career Highlights

Feiyue Ma is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing innovative solutions that address the challenges faced in semiconductor manufacturing. His expertise in metal processing techniques has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, Feiyue Ma has collaborated with notable colleagues, including Kai Wu and Vikash Banthia. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in semiconductor processing.

Conclusion

Feiyue Ma's contributions to the field of semiconductor processing through his patents and work at Applied Materials, Inc. highlight his role as a key innovator. His advancements in metal gapfill methods and etching techniques continue to influence the semiconductor industry positively.