The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Sep. 08, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kai Wu, Palo Alto, CA (US);
Vikash Banthia, Los Altos, CA (US);
Sang Ho Yu, Cupertino, CA (US);
Mei Chang, Saratoga, CA (US);
Feiyue Ma, Sunnyvale, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/285 (2006.01); H01L 23/532 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02074 (2013.01); H01L 21/02068 (2013.01); H01L 21/02697 (2013.01); H01L 21/28556 (2013.01); H01L 21/28568 (2013.01); H01L 21/768 (2013.01); H01L 23/53209 (2013.01);
Abstract
Methods to selectively deposit a film on a first surface (e.g., a metal surface) relative to a second surface (e.g., a dielectric surface) by exposing the surface to a pre-clean plasma comprising one or more of argon or hydrogen followed by deposition. The first surface and the second surface can be substantially coplanar. The selectivity of the deposited film may be increased by an order of magnitude relative to the substrate before exposure to the pre-cleaning plasma.