Fabien Piallat

Title: Fabien Piallat: Innovator in Chemical Vapor Deposition Technologies

Introduction

Fabien Piallat is a notable inventor based in Montbonnot-Saint-Martin, France. He has made significant contributions to the field of chemical vapor deposition, with a total of four patents to his name. His work focuses on methods that enhance the efficiency and effectiveness of material deposition processes.

Latest Patents

Among his latest patents, one includes a method for depositing an insulating material into a via. This innovative approach involves the gas-phase injection of a first chemical species with a precursor of the insulating material into a deposition chamber. The process utilizes a first pulse sequence for the injection, along with a second gas-phase injection of a second chemical species that reacts with the precursor. This method also incorporates the generation of plasma from both high frequency and low frequency sources, optimizing the deposition process.

Another significant patent by Piallat details a method for producing an interconnection that includes a via extending through a substrate. This method involves the deposition of a layer of titanium nitride or tantalum nitride on the substrate's surface, followed by the deposition of a copper layer. The process is characterized by the sequential injection of precursors and reactive gases, ensuring a high-quality interconnection.

Career Highlights

Fabien Piallat has worked with various companies, including Plasma-Therm, Inc. His experience in the industry has allowed him to refine his techniques and contribute to advancements in deposition technologies. His innovative methods have garnered attention for their potential applications in various fields.

Collaborations

Throughout his career, Piallat has collaborated with notable professionals, including Julien Vitiello and Jean-Luc Delcarri. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Fabien Piallat is a distinguished inventor whose work in chemical vapor deposition has led to significant advancements in the field. His innovative methods and collaborative efforts continue to influence the industry, showcasing the importance of creativity and research in technological development.