Taipei, Taiwan

Fa-Yuan Chang


Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2000-2011

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5 patents (USPTO):Explore Patents

Title: Fa-Yuan Chang: Innovator in Semiconductor Technology

Introduction

Fa-Yuan Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative methods that enhance the fabrication and bonding processes in microelectronic devices.

Latest Patents

One of his latest patents is a semiconductor fabrication method suitable for MEMS. This method involves depositing a layer of sacrificial material in a designated region above a substrate, which is separate from another region where a corrosion-resistant film is applied. The process includes removing the first portion of the corrosion-resistant film through chemical mechanical polishing and etching the sacrificial material selectively.

Another notable patent is a process for wafer bonding, which outlines a method for manufacturing microelectronic devices. This method includes forming a top metal layer on a substrate, applying a dielectric layer, and performing a chemical mechanical polishing process before bonding the first substrate to a second substrate. These innovations are crucial for advancing microelectronic device manufacturing.

Career Highlights

Fa-Yuan Chang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His expertise in semiconductor fabrication has positioned him as a key player in the industry. His patents reflect his commitment to improving manufacturing processes and enhancing device performance.

Collaborations

Throughout his career, Fa-Yuan has collaborated with notable colleagues, including Hua-Shu Ivan Wu and Ming-Yeon Hung. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Fa-Yuan Chang's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a leading inventor in the industry. His work continues to influence the future of microelectronic device manufacturing.

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