Eung-Sug Lee

Title: Eung-Sug Lee: Innovator in Nanoimprint Technology

Introduction

Eung-Sug Lee is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of nanoimprint technology, holding a total of 10 patents. His innovative methods have advanced the manufacturing processes of three-dimensional structures and embedded patterns.

Latest Patents

One of his latest patents is a "Method for manufacturing three-dimensional structure using nanoimprint method." This method involves several steps, including stamp preparation, material formation, material stacking, and functional layer securing. The process allows for the creation of complex three-dimensional structures through precise nano-imprinting techniques.

Another notable patent is the "Method for fabricating an embedded pattern using a transfer-based imprinting." This method includes forming an adhesive layer on a substrate, preparing a stamp with a protruded pattern, and curing the adhesive layer with ultraviolet rays after transferring the thin-film layer. This innovative approach enhances the efficiency of pattern fabrication.

Career Highlights

Eung-Sug Lee has worked with esteemed organizations such as the Korea Institute of Machinery & Materials and Admbioscience Inc. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in nanoimprint technology.

Collaborations

Throughout his career, Eung-Sug Lee has collaborated with talented individuals, including Jun-ho Jeong and Young-Suk Sim. These partnerships have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Eung-Sug Lee's contributions to nanoimprint technology have positioned him as a leading inventor in this innovative field. His patents reflect a commitment to advancing manufacturing techniques and enhancing the capabilities of three-dimensional structures.