The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Dec. 26, 2012
Applicant:

Korea Institute of Machinery & Materials, Daejeon, KR;

Inventors:

Eung-Sug Lee, Daejeon, KR;

Joo Yun Jung, Daejeon, KR;

Jun Hyuk Choi, Daejeon, KR;

Jae Won Hahn, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 37/26 (2006.01); G03F 7/20 (2006.01); B81C 99/00 (2010.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B32B 37/26 (2013.01); G03F 7/2004 (2013.01); B81C 2201/0152 (2013.01); B81C 99/009 (2013.01); G03F 7/0002 (2013.01); G03F 7/0017 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.


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