The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2011
Filed:
Oct. 18, 2006
Jun-ho Jeong, Daejeon, KR;
Young-suk Sim, Seoul, KR;
Ki-don Kim, Seoul, KR;
Dae-geun Choi, Daejeon, KR;
Eung-sug Lee, Daejeon, KR;
Jun-Ho Jeong, Daejeon, KR;
Young-Suk Sim, Seoul, KR;
Ki-Don Kim, Seoul, KR;
Dae-Geun Choi, Daejeon, KR;
Eung-Sug Lee, Daejeon, KR;
Korea Institute of Machinery & Materials, Daejeon, KR;
Abstract
The present invention relates to a micro/nano imprint lithography technique and in particular, to a stamp that is used in an UV-micro/nano imprint lithography process or thermal micro/nano imprint lithography process and a method for fabricating the stamp. The method for fabricating a stamp for micro/nano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.