Company Filing History:
Years Active: 2005-2011
Title: Young-Suk Sim: Innovator in Nanoimprint Lithography
Introduction
Young-Suk Sim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of nanoimprint lithography, holding a total of 5 patents. His work focuses on developing advanced processes and apparatuses that enhance the fabrication of nanostructures.
Latest Patents
One of his latest patents is the "UV nanoimprint lithography process and apparatus." This invention provides a method for repeatedly fabricating nanostructures on substrates, such as wafers or UV-transparent plates, using a stamp that is equal to or smaller than the substrate in size. The apparatus includes a substrate chuck for mounting the substrate, a stamp made of UV-transparent materials with multiple element stamps, a stamp chuck for mounting the stamp, a UV lamp unit for curing resist, a moving unit for pressing the resist, and a pressure supply unit for applying pressurized gas to selected regions of the substrate.
Another notable patent is the "Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same." This invention relates to a micro/nano imprint lithography technique, specifically focusing on the fabrication of a stamp used in UV or thermal micro/nano imprint lithography processes. The method involves depositing a thin film of diamond-like carbon on a substrate, applying resist, patterning the resist, etching the diamond-like carbon thin film, and removing the resist.
Career Highlights
Young-Suk Sim is affiliated with the Korea Institute of Machinery and Materials, where he continues to innovate in the field of nanoimprint lithography. His work has garnered attention for its potential applications in various industries, including electronics and materials science.
Collaborations
He has collaborated with notable colleagues, including Jun-ho Jeong and Eung-Sug Lee, who contribute to his research endeavors.
Conclusion
Young-Suk Sim's contributions to nanoimprint lithography exemplify the innovative spirit of modern inventors. His patents reflect a commitment to advancing technology and improving fabrication processes in the field.
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