The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Feb. 24, 2005
Jun-ho Jeong, Daejeon, KR;
Hyonkee Sohn, Daejeon, KR;
Young-suk Sim, Seoul, KR;
Young-jae Shin, Daejeon, KR;
Eung-sug Lee, Daejeon, KR;
Kyung-hyun Whang, Daejeon, KR;
Jun-Ho Jeong, Daejeon, KR;
HyonKee Sohn, Daejeon, KR;
Young-Suk Sim, Seoul, KR;
Young-Jae Shin, Daejeon, KR;
Eung-Sug Lee, Daejeon, KR;
Kyung-Hyun Whang, Daejeon, KR;
Korea Institute of Machinery & Materials, Daejeon, KR;
Abstract
A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.