Daejeon, South Korea

Young-Jae Shin


Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 53(Granted Patents)


Company Filing History:


Years Active: 2005-2011

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4 patents (USPTO):Explore Patents

Title: Young-Jae Shin: Innovator in UV Nanoimprint Lithography

Introduction: Young-Jae Shin is a distinguished inventor based in Daejeon, South Korea. He has made significant contributions to the field of nanotechnology, with a total of four patents to his name. His innovative work is primarily focused on UV nanoimprint lithography processes, which have transformative potential in various industrial applications.

Latest Patents: One of Young-Jae Shin's latest patents involves a pioneering UV nanoimprint lithography process and its accompanying apparatus. This technology enables the repeated fabrication of nanostructures on substrates, including wafers and UV-transparent plates, utilizing a stamp that is either the same size as or smaller than the substrate. The apparatus he developed comprises several key components, including a substrate chuck for mounting the substrate, multiple element stamps made from UV-transparent materials, and a UV lamp unit for curing the resist applied between the stamps and the substrate. Additionally, it features a moving unit for precise positioning during the imprinting process, as well as a pressure supply unit designed to enhance the filling of element stamps by applying pressurized gas to select areas of the substrate.

Career Highlights: Young-Jae Shin currently works at the Korea Institute of Machinery and Materials, where he continues to push the boundaries of nanotechnology and materials science. His research and inventions have garnered recognition in both academic and industrial circles, signifying his vital role in the advancement of innovative manufacturing processes.

Collaborations: Throughout his career, Young-Jae Shin has collaborated with esteemed colleagues including Jun-ho Jeong and HyonKee Sohn. These partnerships have fostered an environment of creativity and shared insights, resulting in important advancements in the field of nanoimprint lithography.

Conclusion: Young-Jae Shin’s inventive spirit and dedication to advancing nanotechnology highlight his importance as an inventor in today’s technological landscape. His contributions, including the UV nanoimprint lithography process, not only illustrate the potential for innovation in manufacturing but also pave the way for future developments in various applications across different industries.

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