The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Feb. 23, 2005
Jun-ho Jeong, Daejeon, KR;
Hyonkee Sohn, Daejeon, KR;
Young-suk Sim, Seoul, KR;
Young-jae Shin, Daejeon, KR;
Eung-sug Lee, Daejeon, KR;
Kyung-hyun Whang, Daejeon, KR;
Jun-Ho Jeong, Daejeon, KR;
HyonKee Sohn, Daejeon, KR;
Young-Suk Sim, Seoul, KR;
Young-Jae Shin, Daejeon, KR;
Eung-Sug Lee, Daejeon, KR;
Kyung-Hyun Whang, Daejeon, KR;
Korea Institute of Machinery & Materials, Dae-Jeon, KR;
Abstract
A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM). The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.