Eun Jeagal

Title: Innovations of Eun Jeagal in Photoresist Technology

Introduction

Eun Jeagal is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of photoresist technology, holding a total of four patents. His work primarily focuses on methods for forming metal patterns, which are essential in various electronic applications.

Latest Patents

Eun Jeagal's latest patents include a photoresist composition and a method for forming a metal pattern. This method involves forming a metal layer on a base substrate, followed by coating a photoresist composition that includes a binder resin, a photo-sensitizer, and a mixed solvent. The coating layer is then exposed to light, allowing for the creation of a photoresist pattern that serves as a mask for patterning the metal layer. Another significant patent involves a photoresist composition, a method of forming a pattern, and a method of manufacturing a thin film transistor substrate. This composition includes a solvent, a novolak resin, a diazide-based photo-sensitizer, and an acryl compound.

Career Highlights

Eun Jeagal is currently employed at Samsung Display Co., Ltd., where he continues to innovate in the field of display technologies. His expertise in photoresist compositions has positioned him as a key player in the development of advanced manufacturing processes for electronic devices.

Collaborations

Eun Jeagal has collaborated with notable coworkers, including Dong-Min Kim and Ki-Hyun Cho. Their combined efforts contribute to the advancement of technologies in their field.

Conclusion

Eun Jeagal's contributions to photoresist technology and his innovative patents highlight his importance in the electronics industry. His work at Samsung Display Co., Ltd. continues to influence the development of advanced manufacturing techniques.