The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Apr. 05, 2013
Samsung Display Co., Ltd., Yongin, Gyeonggi-do, KR;
Jeong-Won Kim, Suwon-si, KR;
Min Kang, Seoul, KR;
Bong-Yeon Kim, Seoul, KR;
Jin-Ho Ju, Seoul, KR;
Dong-Min Kim, Hwaseong-si, KR;
Tae-Gyun Kim, Yongin-si, KR;
Joo-Kyoung Park, Hwaseong-si, KR;
Chul-Won Park, Gwangmyeong-si, KR;
Jun-Hyuk Woo, Yongin-si, KR;
Won-Young Lee, Hwaseong-si, KR;
Hyun-Joo Lee, Seoul, KR;
Eun Jeagal, Hwaseong-si, KR;
Samsung Display Co., Ltd., Yongin, Gyeonggi-do, KR;
Abstract
A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.