The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
Nov. 03, 2014
Applicant:
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Inventors:
Jeong-Won Kim, Yongin, KR;
Ki-Hyun Cho, Yongin, KR;
Kwang-Woo Park, Yongin, KR;
Chul-Won Park, Yongin, KR;
Jin-Ho Ju, Yongin, KR;
Dong-Min Kim, Yongin, KR;
Eun Jeagal, Yongin, KR;
Assignee:
SAMSUNG DISPLAY CO., LTD., Yongin, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/039 (2006.01); G03F 7/022 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01); G03F 7/42 (2006.01); H01L 21/027 (2006.01); H01L 27/12 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0752 (2013.01); G03F 7/022 (2013.01); G03F 7/039 (2013.01); G03F 7/0757 (2013.01); G03F 7/30 (2013.01); G03F 7/36 (2013.01); G03F 7/42 (2013.01); H01L 21/0271 (2013.01); H01L 21/32133 (2013.01); H01L 21/32139 (2013.01); H01L 27/1288 (2013.01);
Abstract
A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.