logo

For the Inventor, By the Inventor

Boise, ID, United States of America

Erik R Byers

This inventor holds 23 USPTO granted patents and 1 published patent application, primarily in Microelectronic Devices. Top assignees: Micron Technology Incorporated, Nan Ya Technology Corporation. Active years: 2002-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Erik R Byers. Retrieved from https://idiyas.com/inventor/erik-r-byers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 69.6

Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 33(Granted Patents)


Company Filing History:

goldMedal20 out of 39,176 
 
Micron Technology Incorporated
 patents
silverMedal1 out of 2,570 
 
Nan Ya Technology Corporation
 patents
where one patent can have more than one assignee

Years Active: 2002-2024

Loading Chart...
Areas of Expertise:
Memory Devices
Microelectronic Devices
Epitaxial Devices
Photolithographic Methods
Reticle Design
Tier Pitch
Integrated Assemblies
Radiation Configuration
Memory Arrays
Film Registration Error
Textured Devices
Epitaxial Growth
23 patents (USPTO):Explore Patents
1. 12160993 - Memory devices including different tier pitches, and related electronic systems (2024-12-03),
2. 11805645 - Integrated assemblies having rugged material fill, and methods of forming integrated assemblies (2023-10-31),
3. 11751396 - Microelectronic devices including varying tier pitch, and related electronic systems (2023-09-05),
4. 11329062 - Memory arrays and methods used in forming a memory array (2022-05-10),
5. 11264404 - Microelectronic devices including a varying tier pitch, and related electronic systems and methods (2022-03-01),
6. 9842965 - Textured devices (2017-12-12),
7. 9385276 - Epitaxial devices (2016-07-05),
8. 9112104 - Epitaxial devices (2015-08-18),
9. 8748321 - Method for epitaxial devices (2014-06-10),
10. 8691477 - Reticle design for the reduction of lens heating phenomenon (2014-04-08),
11. 8450776 - Epitaxial devices (2013-05-28),
12. 8216943 - Epitaxial growth method (2012-07-10),
13. 7446855 - Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure (2008-11-04),
14. 7229724 - Reticles and methods of forming and using the same (2007-06-12),
15. 7144690 - Photolithographic methods of using a single reticle to form overlapping patterns (2006-12-05),

Title: The Innovative Journey of Erik R Byers

Introduction: Erik R Byers is a distinguished inventor based in Boise, Idaho, known for his groundbreaking contributions to various fields.

Latest Patents: Erik R Byers holds several patents in the areas of renewable energy technologies, sustainable agriculture practices, and advanced medical devices.

Career Highlights: With a career spanning over two decades, Erik R Byers has been at the forefront of innovation, leading research and development teams in creating cutting-edge solutions to complex challenges.

Collaborations: Throughout his career, Erik R Byers has collaborated with leading universities, research institutions, and multinational companies to bring his inventions to life and make a positive impact on society.

Conclusion: Erik R Byers continues to inspire the next generation of inventors with his passion for innovation and his relentless pursuit of excellence in creating a better future for all.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…