The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Aug. 16, 2004
Applicants:
William J. Baggenstoss, Boise, ID (US);
Byron N. Burgess, Boise, ID (US);
Erik Byers, Boise, ID (US);
William A. Stanton, Boise, ID (US);
Inventors:
William J. Baggenstoss, Boise, ID (US);
Byron N. Burgess, Boise, ID (US);
Erik Byers, Boise, ID (US);
William A. Stanton, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Reticles having reticle patterns suitable for reducing edge of array effects are provided. The reticle patterns have unresolvable patterns formed in the periphery areas of the reticle patterns. The unresolvable patterns are non-transparent with respect to patterning radiation. Systems incorporating the reticles are also provided. Additionally, methods of forming and using the reticles are provided.