Eiji Fukatsu

Title: Eiji Fukatsu: Innovator in Substrate Processing Technologies

Introduction

Eiji Fukatsu is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 7 patents. His innovative work focuses on improving the efficiency and effectiveness of substrate treatment methods.

Latest Patents

Fukatsu's latest patents include a substrate treatment device and a substrate treatment method. The substrate holder in his device is designed to hold a substrate at a predetermined position. An etching solution supply unit is responsible for delivering an etching solution to the substrate at this specific location. Additionally, a rotating unit allows the substrate holder to rotate around a predetermined axis. A temperature distribution acquisition unit measures the temperature distribution in the area surrounding the substrate when it is positioned in a chamber. This data is then used by a feature value calculator to determine a feature value related to the etching amount of the substrate.

Another notable patent is the substrate processing apparatus and method. In this invention, preliminary processing is conducted within a chamber. After this initial processing, the temperature in a target region of the chamber is measured using a thermographic camera. Based on the measured temperature information, a decision is made regarding the initiation of second processing on the substrate. This ensures that the second processing can be performed uniformly across multiple substrates, minimizing variations caused by temperature fluctuations in the chamber.

Career Highlights

Eiji Fukatsu has worked with notable companies such as Dainippon Screen Manufacturing Co., Ltd. and Kobe Steel, Ltd. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Fukatsu has collaborated with esteemed colleagues, including Hiroyuki Yashiki and Hiroyuki Ueno. Their joint efforts have further advanced the field of substrate treatment.

Conclusion

Eiji Fukatsu's innovative contributions to substrate processing technologies have established him as a key figure in the industry. His patents reflect a commitment to enhancing the efficiency and effectiveness of substrate treatment methods.