The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Sep. 11, 2019
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Masafumi Inoue, Kyoto, JP;

Eiji Fukatsu, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/00 (2006.01); G01J 5/48 (2022.01); H01L 21/306 (2006.01); H01L 21/673 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6708 (2013.01); B08B 3/00 (2013.01); G01J 5/48 (2013.01); H01L 21/306 (2013.01); H01L 21/67248 (2013.01); H01L 21/673 (2013.01); H01L 21/68764 (2013.01);
Abstract

A substrate holder holds a substrate at a predetermined position. An etching solution supply unit supplies an etching solution to the substrate at the predetermined position. A rotating unit rotates the substrate holder about a predetermined rotation axis. A temperature distribution acquisition unit acquires the temperature distribution in a peripheral area around the substrate area occupied by the substrate when the substrate is arranged at the predetermined position in a chamber. A feature value calculator calculates, from the temperature distribution, a feature value relating an etching amount of the substrate by the etching using the etching solution.


Find Patent Forward Citations

Inoue, Masafumi. (2024). Substrate treatment device and substrate treatment method (U.S. Patent No. 12183599). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12183599

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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