The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Nov. 03, 2003
Yusuke Muraoka, Kyoto, JP;
Kimitsugu Saito, Kyoto, JP;
Tomomi Iwata, Kyoto, JP;
Eiji Fukatsu, Kyoto, JP;
Ikuo Mizobata, Kyoto, JP;
Hiroyuki Ueno, Kyoto, JP;
Yasuo Okuyama, Kyoto, JP;
Takashi Gama, Kyoto, JP;
Yoshihiko Sakashita, Hyogo, JP;
Katsumi Watanabe, Hyogo, JP;
Jun Munemasa, Hyogo, JP;
Hisanori Oshiba, Hyogo, JP;
Shogo Sarumaru, Hyogo, JP;
Yusuke Muraoka, Kyoto, JP;
Kimitsugu Saito, Kyoto, JP;
Tomomi Iwata, Kyoto, JP;
Eiji Fukatsu, Kyoto, JP;
Ikuo Mizobata, Kyoto, JP;
Hiroyuki Ueno, Kyoto, JP;
Yasuo Okuyama, Kyoto, JP;
Takashi Gama, Kyoto, JP;
Yoshihiko Sakashita, Hyogo, JP;
Katsumi Watanabe, Hyogo, JP;
Jun Munemasa, Hyogo, JP;
Hisanori Oshiba, Hyogo, JP;
Shogo Sarumaru, Hyogo, JP;
Abstract
After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unitA,B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unitby a primary transport robot. The supercritical drying unitperforms a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.