Essex Junction, VT, United States of America

Douglas Duane Coolbaugh

USPTO Granted Patents = 145 

 

Average Co-Inventor Count = 4.3

ph-index = 14

Forward Citations = 916(Granted Patents)

Forward Citations (Not Self Cited) = 841(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Newark Valley, NY (US) (1991)
  • Essex Junction, VA (US) (2012)
  • Hopewell Junction, NY (US) (2013)
  • Essex Junction, VT (US) (2001 - 2015)
  • Highland, NY (US) (2008 - 2023)
  • Mechanicville, NY (US) (2020 - 2023)
  • Albany, NY (US) (2020 - 2023)

Company Filing History:


Years Active: 1991-2025

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Areas of Expertise:
Photonics
Optoelectronics
Integrated Circuits
Waveguiding Material
Mim Capacitor
Heat Sink
Dual-Damascene Process
Thin Die-To-Wafer Bonding
Semiconductor Structures
Back End Of Line (Beol)
Conductive Pathways
Signal Transmission
145 patents (USPTO):Explore Patents

Title: The Innovative Legacy of Douglas Duane Coolbaugh

Introduction: Douglas Duane Coolbaugh, a distinguished inventor based in Essex Junction, VT (US), has marked his name in the realm of innovation with a remarkable portfolio of 143 patents. His relentless pursuit of creative solutions to intricate problems serves as an inspiration for aspiring inventors worldwide.

Latest Patents: Among his latest inventions is the "Wafer scale bonded active photonics interposer," which revolutionizes optoelectrical devices by integrating photonics structures with interposer dielectric stacks. This innovation underscores Coolbaugh's prowess in developing cutting-edge technologies that drive progress in the field.

Career Highlights: Coolbaugh's tenure at renowned institutions like IBM and The Research Foundation for the State University of New York has been punctuated by breakthrough innovations that have redefined the boundaries of what is possible in the tech industry. His expertise in integrated photonics, particularly in waveguiding materials like silicon and silicon nitride, showcases his depth of knowledge in the field.

Collaborations: Throughout his career, Coolbaugh has collaborated with esteemed colleagues such as Ebenezer E Eshun and Anthony K Stamper, pooling their collective expertise to tackle complex challenges and bring inventive ideas to life. These partnerships have yielded fruitful results and propelled the advancement of technology in various domains.

Conclusion: In conclusion, Douglas Duane Coolbaugh emerges as a beacon of innovation, embodying the spirit of relentless exploration and creativity that drives progress in the world of inventing. His contributions have left an indelible mark on the tech landscape, shaping the way for future inventors to follow in his pioneering footsteps.

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