Dong Li

This inventor holds 17 USPTO granted patents and 11 published patent applications. Top assignees: Asm IP Holding B.v., Asm America, Inc.. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong Li. Retrieved from https://idiyas.com/inventor/dong-li-bo13rthn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 (Patent Applications = 11)

% Patents Active = 88.2

Average Co-Inventor Count = 4.3

ph-index = 4

Forward Citations = 1,087(Granted Patents)

Company Filing History:

Years Active: 2010-2026

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17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12729430 - Metal-on-metal deposition methods for filling a gap feature on a substrate surface (2026-09-08),

2. 12666885 - Systems and methods for deposition of molybdenum for source/drain contacts (2026-06-23),

3. 12518970 - Methods for depositing a titanium aluminum carbide film structure on a substrate and related semiconductor structures (2026-01-06),

4. 11976361 - Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus (2024-05-07),

5. 11967488 - Method for treatment of deposition reactor (2024-04-23),

6. 11501973 - Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures (2022-11-15),

7. 11306395 - Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus (2022-04-19),

8. 11056567 - Method of forming a doped metal carbide film on a substrate and related semiconductor device structures (2021-07-06),

9. 10872771 - Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures (2020-12-22),

10. 9631272 - Atomic layer deposition of metal carbide films using aluminum hydrocarbon compounds (2017-04-25),

11. 9583348 - Silane and borane treatments for titanium carbide films (2017-02-28),

12. 9466574 - Plasma-enhanced atomic layer deposition of conductive material over dielectric layers (2016-10-11),

13. 9236247 - Silane and borane treatments for titanium carbide films (2016-01-12),

14. 9228259 - Method for treatment of deposition reactor (2016-01-05),

15. 8841182 - Silane and borane treatments for titanium carbide films (2014-09-23),

Title: Dong Li: Pioneering Inventor from Phoenix

Introduction: Dong Li is a distinguished inventor based in Phoenix, Arizona, known for his groundbreaking contributions to various technological fields.

Latest Patents: Dong Li holds several patents in the areas of renewable energy, artificial intelligence, and sustainable agriculture, showcasing his versatility and innovative spirit.

Career Highlights: With a career spanning over two decades, Dong Li has worked with leading research institutions and tech companies, consistently pushing the boundaries of innovation.

Collaborations: Throughout his career, Dong Li has collaborated with top universities and multinational corporations, fostering a culture of creativity and excellence in all his projects.

Conclusion: Dong Li's passion for innovation and his commitment to creating a better future through technology make him a true pioneer in the world of inventions.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

11 patents pending: