The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
May. 16, 2022
Asm Ip Holding B.v., Almere, NL;
Suvi Haukka, Helsinki, FI;
Eric James Shero, Phoenix, AZ (US);
Fred Alokozai, Scottsdale, AZ (US);
Dong Li, Phoenix, AZ (US);
Jereld Lee Winkler, Gilbert, AZ (US);
Xichong Chen, Chandler, AZ (US);
ASM IP Holding B.V., Almere, NL;
Abstract
A system and method for treating a deposition reactor are disclosed. The system and method remove or mitigate formation of residue in a gas-phase reactor used to deposit doped metal films, such as aluminum-doped titanium carbide films or aluminum-doped tantalum carbide films. The method includes a step of exposing a reaction chamber to a treatment reactant that mitigates formation of species that lead to residue formation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile