The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2017

Filed:

Nov. 01, 2013
Applicant:

Asm America, Inc., Phoenix, AZ (US);

Inventors:

Dong Li, Phoenix, AZ (US);

Steven Marcus, Tempe, AZ (US);

Suvi P. Haukka, Helsinki, FI;

Wei-Min Li, Espoo, FI;

Assignee:

ASM AMERICA, INC., Phoenix, AZ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/32 (2006.01); C23C 16/455 (2006.01); H01L 21/28 (2006.01); H01L 29/49 (2006.01); H01L 21/285 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C23C 16/32 (2013.01); C23C 16/45527 (2013.01); H01L 21/28088 (2013.01); H01L 21/28273 (2013.01); H01L 29/4966 (2013.01); H01L 21/28562 (2013.01); H01L 21/76843 (2013.01);
Abstract

Methods of forming metal carbide films are provided. In some embodiments, a substrate is exposed to alternating pulses of a transition metal species and an aluminum hydrocarbon compound, such as TMA, DMAH, or TEA. The aluminum hydrocarbon compound is selected to achieve the desired properties of the metal carbide film, such as aluminum concentration, resistivity, adhesion and oxidation resistance. In some embodiments, the methods are used to form a metal carbide layer that determines the work function of a control gate in a flash memory.


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