The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Aug. 06, 2021
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Petri Raisanen, Gilbert, AZ (US);
Eric Shero, Phoenix, AZ (US);
Ward Johnson, Gilbert, AZ (US);
Dong Li, Phoenix, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/67 (2025.01); C23C 16/32 (2006.01); C23C 16/455 (2006.01); H01L 21/28 (2006.01); H10D 64/66 (2025.01);
U.S. Cl.
CPC ...
H01L 21/28088 (2013.01); C23C 16/32 (2013.01); C23C 16/45553 (2013.01); H10D 30/6739 (2025.01); H10D 64/667 (2025.01);
Abstract
Methods for depositing a titanium aluminum carbide (TiAlC) film structure on a substrate are disclosed. The methods may include: depositing a first TiAlC film on a substrate utilizing a first cyclical deposition process, and depositing a second TiAlC film over the first TiAlC film utilizing a second cyclical deposition process. Semiconductor structures including titanium aluminum carbide (TiAlC) film structures deposited by the methods of the disclosure are also disclosed.