Gyeonggi, South Korea

Dong Hyung Lee

This inventor holds 7 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2007-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong Hyung Lee. Retrieved from https://idiyas.com/inventor/dong-hyung-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 71.4

Average Co-Inventor Count = 7.4

ph-index = 3

Forward Citations = 24(Granted Patents)


Location History:

  • Suwon Kyunggi, KR (2007)
  • Gyeonggi-do, KR (2010)
  • Kyunggi, KR (2014)
  • Yongin-Si, KR (2018)
  • Danville, CA (US) (2020 - 2023)

Company Filing History:


Years Active: 2007-2023

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7 patents (USPTO):Explore Patents

Title: Innovations by Dong Hyung Lee

Introduction

Dong Hyung Lee is a notable inventor based in Kyunggi, South Korea. He has made significant contributions to the field of semiconductor processing, holding a total of 7 patents. His work focuses on advanced methods for cleaning and depositing materials in semiconductor manufacturing.

Latest Patents

One of his latest patents is related to a treatment for high-temperature cleans. This exemplary method involves delivering a cleaning precursor to a remote plasma unit, forming a plasma of the cleaning precursor, and delivering plasma effluents to a processing region of a semiconductor processing chamber. The processing region is defined by various chamber components, which may include an oxide coating. The method also includes halting the delivery of plasma effluents and treating the oxide coating with a hydrogen-containing material after halting the delivery.

Another significant patent by Dong Hyung Lee is focused on highly etch selective amorphous carbon film. This method includes depositing an amorphous carbon film on an underlayer positioned on a susceptor in a first processing region. It further involves implanting a dopant or inert species into the amorphous carbon film in a second processing region. The combination of implant species, energy, dose, and temperature is utilized to enhance the hardness of the hardmask. The method also includes patterning the doped amorphous carbon film and etching the underlayer.

Career Highlights

Dong Hyung Lee is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His innovative work has contributed to advancements in semiconductor processing technologies.

Collaborations

He has collaborated with notable coworkers, including Sarah Michelle Bobek and Kwangduk Douglas Lee, to further enhance the development of semiconductor technologies.

Conclusion

Dong Hyung Lee's contributions to semiconductor processing through his patents and collaborations highlight his importance in the field of innovation. His work continues to influence advancements in technology and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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