The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2023
Filed:
May. 25, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Sarah Michelle Bobek, Sunnyvale, CA (US);
Ruiyun Huang, Santa Clara, CA (US);
Abdul Aziz Khaja, San Jose, CA (US);
Amit Bansal, Milpitas, CA (US);
Dong Hyung Lee, Danville, CA (US);
Ganesh Balasubramanian, Fremont, CA (US);
Tuan Anh Nguyen, San Jose, CA (US);
Sungwon Ha, Palo Alto, CA (US);
Anjana M. Patel, San Jose, CA (US);
Ratsamee Limdulpaiboon, San Jose, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Kwangduk Douglas Lee, Redwood City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Exemplary methods of treating a chamber may include delivering a cleaning precursor to a remote plasma unit. The methods may include forming a plasma of the cleaning precursor. The methods may include delivering plasma effluents of the cleaning precursor to a processing region of a semiconductor processing chamber. The processing region may be defined by one or more chamber components. The one or more chamber components may include an oxide coating. The methods may include halting delivery of the plasma effluents. The methods may include treating the oxide coating with a hydrogen-containing material delivered to the processing region subsequent halting delivery of the plasma effluents.