The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Apr. 12, 2010
Dongwon Choi, San Jose, CA (US);
Dong Hyung Lee, Kyunggi, KR;
Tze Poon, Sunnyvale, CA (US);
Manoj Vellaikal, Sunnyvale, CA (US);
Peter Porshnev, San Jose, CA (US);
Majeed Foad, Sunnyvale, CA (US);
Dongwon Choi, San Jose, CA (US);
Dong Hyung Lee, Kyunggi, KR;
Tze Poon, Sunnyvale, CA (US);
Manoj Vellaikal, Sunnyvale, CA (US);
Peter Porshnev, San Jose, CA (US);
Majeed Foad, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for substrate processing includes a process chamber having a chamber body defining an inner volume; and a silicon containing coating disposed on an interior surface of the chamber body, wherein an outer surface of the silicon containing coating is at least 35 percent silicon (Si) by atom. In some embodiments, a method for forming a silicon containing coating in a process chamber includes providing a first process gas comprising a silicon containing gas to an inner volume of the process chamber; and forming a silicon containing coating on an interior surface of the process chamber, wherein an outer surface of the silicon containing coating is at least 35 percent silicon.