logo

For the Inventor, By the Inventor

Langenau, Germany

Dirk Hellweg

This inventor holds 16 USPTO granted patents and 2 published patent applications and 2 EPO patents, primarily in Microlithography Metrology. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2012-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dirk Hellweg. Retrieved from https://idiyas.com/inventor/dirk-hellweg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 14(Granted Patents)


Location History:

  • Aalen, DE (2012 - 2018)
  • Langenau, DE (2019 - 2022)

Company Filing History:

goldMedal16 out of 1,485 
 
Carl Zeiss Smt Gmbh
 patents

Years Active: 2012-2025

Loading Chart...
Loading Chart...
Areas of Expertise:
Microlithography
Optical Systems
Mask Qualification
Metrology
EUV Optical Unit
Image Placement Errors
Edge Position Determination
Fluctuation Analysis
Imaging Aberration
Projection Exposure
Photolithographic Masks
16 patents (USPTO):Explore Patents
1. 12422743 - Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method (2025-09-23),
2. 12353141 - Method for heating an optical element in a microlithographic projection exposure apparatus and optical system (2025-07-08),
3. 11460785 - Method for the qualification of a mask for microlithography (2022-10-04),
4. 11256178 - Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method (2022-02-22),
5. 11061331 - Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth (2021-07-13),
6. 10948637 - Metrology system having an EUV optical unit (2021-03-16),
7. 10775691 - Method for examining photolithographic masks and mask metrology apparatus for performing the method (2020-09-15),
8. 10761420 - Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method (2020-09-01),
9. 10564551 - Method for determining a focus position of a lithography mask and metrology system for carrying out such a method (2020-02-18),
10. 10481505 - Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks (2019-11-19),
11. 9915871 - Method for measuring an angularly resolved intensity distribution and projection exposure apparatus (2018-03-13),
12. 9785052 - Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors (2017-10-10),
13. 9081294 - Method for measuring an angularly resolved intensity distribution and projection exposure apparatus (2015-07-14),
14. 8659745 - Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations (2014-02-25),
15. 8542346 - Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations (2013-09-24),

Title: Dirk Hellweg: Innovator in Metrology and Optical Systems

Introduction

Dirk Hellweg is a prominent inventor based in Langenau, Germany. He has made significant contributions to the fields of metrology and optical systems, holding a total of 16 patents. His work focuses on innovative methods and systems that enhance measurement precision and efficiency.

Latest Patents

Among his latest patents is a method for measuring the reflectivity of an object for measurement light. This method involves a reflectivity measurement apparatus that includes a measurement light source, an object holder, and a spatially resolving detector. The apparatus captures measurement light reflected by the object, allowing for precise determination of reflectivity parameters, particularly for finely structured objects like lithography masks. Another notable patent is a method for heating an optical element in a microlithographic projection exposure apparatus. This method utilizes a heating arrangement to regulate heating power based on a setpoint value, which is varied over time to simulate thermal behavior.

Career Highlights

Dirk Hellweg is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and metrology. His innovative approaches have significantly advanced the capabilities of measurement technologies.

Collaborations

He has collaborated with notable coworkers, including Markus Koch and Renzo Capelli, contributing to the development of cutting-edge technologies in their field.

Conclusion

Dirk Hellweg's contributions to metrology and optical systems exemplify the impact of innovative thinking in technology. His patents reflect a commitment to precision and advancement in measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…