The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2020
Filed:
Feb. 20, 2019
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Markus Koch, Neu-Ulm, DE;
Dirk Hellweg, Langenau, DE;
Renzo Capelli, Heidenheim, DE;
Martin Dietzel, Giengen a. d. Brenz, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70483 (2013.01); G03F 1/0092 (2013.01); G03F 7/705 (2013.01); G03F 7/70091 (2013.01); G03F 7/70583 (2013.01); G03F 7/70591 (2013.01); G03F 7/70641 (2013.01); G03F 7/70666 (2013.01); G03F 7/70775 (2013.01);
Abstract
For determining a focus position of a lithography mask (e.g., 5), a focus stack of a measurement region free of structures to be imaged is recorded and the speckle patterns of the recorded images are evaluated.