Dirk Efferenn

Title: Dirk Efferenn: Innovator in Semiconductor Technology

Introduction

Dirk Efferenn is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His innovative approaches have paved the way for advancements in the industry.

Latest Patents

One of his latest patents is a process for removing a residue from a metal structure on a semiconductor substrate. This invention involves several steps, including heating the substrate in the presence of molecular nitrogen gas, a stabilization step with pure nitrogen, a passivation step using plasma, and a stripping step with oxygen to effectively remove the residue. Another notable patent is a method for masking a recess in a structure with a high aspect ratio. This method describes a selective masking process where a filling material is applied, forming cavities based on the aspect ratio, and subsequently removed to expose areas selectively.

Career Highlights

Throughout his career, Dirk Efferenn has worked with leading companies in the semiconductor industry, including Infineon Technologies AG and Nan Ya Technology Corporation. His work has been instrumental in developing processes that enhance the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

Dirk has collaborated with notable professionals in his field, including Hans-Peter Moll and Andreas Wich-Glasen. These collaborations have contributed to the advancement of technology and innovation in semiconductor processes.

Conclusion

Dirk Efferenn's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes.