The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Aug. 27, 2002
Dirk Efferenn, Dresden, DE;
Ulrike Grüning Von Schwerin, München, DE;
Hans-peter Moll, Dresden, DE;
Jörg Radecker, Dresden, DE;
Andreas Wich-glasen, Langebrück, DE;
Dirk Efferenn, Dresden, DE;
Ulrike Grüning Von Schwerin, München, DE;
Hans-Peter Moll, Dresden, DE;
Jörg Radecker, Dresden, DE;
Andreas Wich-Glasen, Langebrück, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A description is given of a method for a selective masking of a structure with a small structure surface with respect to a structure with a larger structure surface. To that end, the structures are filled with a covering layer. The covering layer is formed with a larger thickness above the first structure, which has the larger structure surface, than above the second structure. Afterward, the covering layer is removed by a homogeneous removal method, so that first the structure surface of the second structure is uncovered. A simple self-aligning method for fabricating a mask for uncovering the second structure is thus provided.