The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2008
Filed:
Nov. 22, 2004
Ronald Gottzein, Dresden, DE;
Jens Bachmann, Dresden, DE;
Dirk Efferenn, Dresden, DE;
Uwe Kahler, Dresden, DE;
Chung-hsin Lin, Dresden, DE;
Wen-bin Lin, Dresden, DE;
Lee Donohue, Dresden, DE;
Ronald Gottzein, Dresden, DE;
Jens Bachmann, Dresden, DE;
Dirk Efferenn, Dresden, DE;
Uwe Kahler, Dresden, DE;
Chung-Hsin Lin, Dresden, DE;
Wen-Bin Lin, Dresden, DE;
Lee Donohue, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
The invention is concerned with a process for removing residue comprising a polymeric resist and metal oxide from a metal structure on a semiconductor substrate, the process comprising the steps of: (a) heating up the substrate with the metal structure in the presence of molecular nitrogen gas (N); (b) a stabilization step in the presence of pure molecular nitrogen gas (N); (c) a passivation step employing a plasma containing at least one of the group of water, nitrogen and oxygen; and (d) a stripping step containing oxygen to remove the residue, comprising resist.