Chung-Hsin Lin

Title: Innovations of Chung-Hsin Lin

Introduction

Chung-Hsin Lin is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of his latest patents is titled "Method of fabricating semiconductor device having voids between top metal layers of metal interconnects." This invention provides a semiconductor device that includes a substrate, a dielectric layer, a dummy bonding pad, a bonding pad, a redistribution layer, and a metal interconnect. The substrate is designed with both a non-device region and a device region. The dielectric layer is positioned on both regions, while the dummy bonding pad is located on the dielectric layer of the non-device region. The metal interconnect is embedded in the dielectric layer of the non-device region and is connected to the dummy bonding pad. The bonding pad is situated on the dielectric layer of the device region, with a buffer layer placed between the bonding pad and the dielectric layer. This buffer layer can consist of metal, metal nitride, or a combination of both. The redistribution layer is also on the dielectric layer, linking the dummy bonding pad and the bonding pad.

Another significant patent by Chung-Hsin Lin is similarly focused on semiconductor devices, emphasizing the importance of voids between top metal layers of metal interconnects. This invention shares many features with the previous patent, highlighting his consistent approach to improving semiconductor technology.

Career Highlights

Chung-Hsin Lin has worked with notable companies in the semiconductor industry, including Nan Ya Technology Corporation and Infineon Technologies AG. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor fabrication.

Collaborations

Throughout his career, Chung-Hsin Lin has collaborated with talented individuals such as Ping-Heng Wu and Chao-Wen Lay. These collaborations have contributed to the advancement of his inventions and the overall progress in semiconductor technology.

Conclusion

Chung-Hsin Lin is a distinguished inventor whose work in semiconductor technology has led to multiple patents and significant advancements in the field. His innovative methods continue to influence the development of modern electronic devices.