Location History:
- Eindhoven, NL (2004)
- Delft, NL (2017)
- 's-Gravenhage, NL (2018)
- Breda, NL (2009 - 2024)
Company Filing History:
Years Active: 2004-2025
Title: Diederik Jan Maas: Pioneering Innovations in the World of Lithography
Introduction:
Diederik Jan Maas is a highly respected inventor based in Breda, Netherlands, known for his exceptional ability to bring groundbreaking ideas to life. With a significant portfolio of 9 patents, he is renowned for his contributions to the field of lithography and atomic layer deposition.
Latest Patents:
1. Lithographic Patterning Method: Maas' patent describes a sophisticated method for creating features on a substrate surface, utilizing resist material and surface treatment to achieve precise patterning. The inclusion of acoustic scanning probe microscopy adds a layer of sophistication to the process, enabling accurate measurements of critical dimensions.
2. Apparatus and Method for Atomic Layer Deposition: This patent showcases Maas' expertise in atomic layer deposition, introducing an innovative apparatus with a precursor injector head. The apparatus allows for controlled deposition of precursor gas on the substrate surface, providing a new level of precision in the deposition process.
Career Highlights:
Throughout his career, Diederik Jan Maas has made significant contributions to companies like TNO (Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek) and FEI Company, where he has played a pivotal role in advancing lithography and deposition technologies. His innovative spirit and dedication to excellence have earned him a reputation as a trailblazer in the industry.
Collaborations:
Maas has had the privilege of working alongside accomplished professionals such as Jan Bernard Plechelmus Van Schoot and Sjoerd Antonius Maria Mentink. These collaborations have not only enriched his work but have also led to the development of impactful inventions that have had a lasting influence on the field of nanotechnology.
Conclusion:
Diederik Jan Maas' remarkable journey as an inventor exemplifies the power of innovation and relentless pursuit of excellence. His pioneering work in lithography and atomic layer deposition continues to shape the landscape of modern technology, inspiring the next generation of inventors to push the boundaries of what is possible in the world of nanoscience and engineering.