The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2023
Filed:
Aug. 25, 2009
Diederik Jan Maas, Breda, NL;
Bob Van Someren, Rotterdam, NL;
Axel Sebastiaan Lexmond, Voorschoten, NL;
Carolus Ida Maria Antonius Spee, Helmond, NL;
Antonie Ellert Duisterwinkel, Delft, NL;
Adrianus Johannes Petrus Maria Vermeer, Geldrop, NL;
Diederik Jan Maas, Breda, NL;
Bob van Someren, Rotterdam, NL;
Axel Sebastiaan Lexmond, Voorschoten, NL;
Carolus Ida Maria Antonius Spee, Helmond, NL;
Antonie Ellert Duisterwinkel, Delft, NL;
Adrianus Johannes Petrus Maria Vermeer, Geldrop, NL;
Abstract
Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.